New Fabrication Technique on a Submicrometer Scale by Synchrotron Radiation Excited Etching

S. Terakado, T. Goto, M. Ogura, K. Kaneda, O. Kitamura, S. Suzuki, M. Nakao, K. Tanaka

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

1995/06

44

2175

～

2178

学術論文(学術雑誌)