著作(論文等)
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Soft X-ray Stimulated Etching Reaction in the SF6/SiO2 Adsorption System Studied by Neutral Products Detection
H. Ikeura, K. Tanaka, T. Sekiguchi, K. Obi, K. Kaneda, O. Kitamura
APPLIED SURFACE SCIENCE
1994/03
79/80
62
～
65
学術論文(学術雑誌)
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